In-line airborne particle sensing supports faster response to contamination excursions

V. Vijay

doi:10.1117/12.2613075

26 August 2021 In-line airborne particle sensing supports faster response to contamination excursions

V. Vijay

Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 119080W (2021) https://doi.org/10.1117/12.2613075
Event: Photomask Japan 2021, 2021, Online Only

Abstract

Fine particles (less than 5 micrometers in diameter) do not affect most industrial processes, but they can have a disastrous impact on semiconductor manufacturing. From the earliest days, manufacturing facilities have deployed air filtering and recirculation to remove particles from the cleanroom, but particles may still be generated inside process tools, where they can cause defects and yield loss. Quickly identifying when and where airborne particles originate can be challenging, but it is critical to success. Conventional methods for monitoring and diagnosing contamination problems take considerable time to return results, and, because of their intermittent nature, they may not see contamination episodes until the damage is detected by downstream inspections. In-line particle sensing (IPS) provides continuous, real-time monitoring, shortening response times and potentially limiting damage to work-in-progress.

Citation Download Citation

V. Vijay "In-line airborne particle sensing supports faster response to contamination excursions", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080W (26 August 2021); https://doi.org/10.1117/12.2613075

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