Atomic layer deposition of thin films of hafnium oxide using Izofaz TM 200-01 system

Sergey S. Zyuzin; Yason G. Zasseev; Askar A. Rezvanov; Vitaliy V. Panin; Vladimir A. Gvozdev; Yevgeniy S. Gornev

doi:10.1117/12.2624575

30 January 2022 Atomic layer deposition of thin films of hafnium oxide using Izofaz TM 200-01 system

Sergey S. Zyuzin, Yason G. Zasseev, Askar A. Rezvanov, Vitaliy V. Panin, Vladimir A. Gvozdev, Yevgeniy S. Gornev

Proceedings Volume 12157, International Conference on Micro- and Nano-Electronics 2021; 121571H (2022) https://doi.org/10.1117/12.2624575
Event: International Conference on Micro- and Nano-Electronics 2021, 2021, Zvenigorod, Russian Federation

Abstract

This paper presents results achieved in thin films deposition of hafnium oxide by using the Russian system “Izofaz TM 200-01” developed by the Research Institute of Precision Machine Manufacturing. Tetrakis(ethylmethylamino)hafnium(IV) (TEMAH) and oxygen plasma were used as precursors for atomic layer deposition. Thin films with various thicknesses (100-300 Å) of high uniformity and overall quality were obtained.

Citation Download Citation

Sergey S. Zyuzin, Yason G. Zasseev, Askar A. Rezvanov, Vitaliy V. Panin, Vladimir A. Gvozdev, and Yevgeniy S. Gornev "Atomic layer deposition of thin films of hafnium oxide using Izofaz TM 200-01 system", Proc. SPIE 12157, International Conference on Micro- and Nano-Electronics 2021, 121571H (30 January 2022); https://doi.org/10.1117/12.2624575

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