Paper
15 February 2022 Elastic emission polishing based on shear thickening slurry
Author Affiliations +
Proceedings Volume 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021); 1216608 (2022) https://doi.org/10.1117/12.2604939
Event: Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 2021, Hong Kong, Hong Kong
Abstract
Elastic emission polishing (EEM) has excellent polishing surface quality, and shear thickening can improve polishing removal efficiency. This paper mainly studies the effect of shear thickening slurry on EEM. Firstly, the polishing device and removal mechanism based on shear thickening are introduced. Then a single-point contrast polishing experiment was carried out. It is found that the shear thickening slurry can improve the removal efficiency of ordinary EEM, the former is about 2.7 times that of the latter.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lianmin Yin, Yifan Dai, Hao Hu, and Chaoliang Guan "Elastic emission polishing based on shear thickening slurry", Proc. SPIE 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 1216608 (15 February 2022); https://doi.org/10.1117/12.2604939
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KEYWORDS
Polishing

Surface finishing

Particles

Chemical species

Optical components

Abrasives

Chemical reactions

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