Si transfer and self-limiting chemisorption on Ru thin film surface in hydrogen radicals environment

Ilias Gaffarov; Jacobus M. Sturm; Ard Vlooswijk; Paul de Heij; Marcelo D. Ackermann; Igor A. Makhotkin

doi:10.1117/12.2682704

6 June 2023 Si transfer and self-limiting chemisorption on Ru thin film surface in hydrogen radicals environment

Ilias Gaffarov, Jacobus M. Sturm, Ard Vlooswijk, Paul de Heij, Marcelo D. Ackermann, Igor A. Makhotkin

Proceedings Volume 12578, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8); 125780L (2023) https://doi.org/10.1117/12.2682704
Event: SPIE Optics + Optoelectronics, 2023, Prague, Czech Republic

Conference Poster

There is no online version at this time. The PDF is only available to people who have bought the paper or have a subscription.

Citation Download Citation

Ilias Gaffarov, Jacobus M. Sturm, Ard Vlooswijk, Paul de Heij, Marcelo D. Ackermann, and Igor A. Makhotkin "Si transfer and self-limiting chemisorption on Ru thin film surface in hydrogen radicals environment", Proc. SPIE 12578, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8), 125780L (6 June 2023); https://doi.org/10.1117/12.2682704

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available