Techniques for the analysis of Cl- ion in TMAH

Bang-Chein Ho; Mong-Ling Chang; Yu-Ping Lin

doi:10.1117/12.312436

29 June 1998 Techniques for the analysis of Cl^- ion in TMAH

Bang-Chein Ho, Mong-Ling Chang, Yu-Ping Lin

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312436
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Fabricating integrated circuits with increasingly smaller elements mandates that the chlorine ion contents in 2.38% TMAH to be under the 50 ppb level. Previously, the interference from TMAH inhibited the analysis of chlorine ion in TMAH by ion chromatography. In this study, we present a novel technique to eliminate the annoying interference from TMAH. By using of acid type cation exchange resin Amberite IR-120, the interference from TMA⁺ and OH^- is successfully eliminated. The TMA⁺ cation is retained in the exchange resin and the OH^- from TMAH neutralized with the H⁺ released from the resin. This relatively simple scheme of cation exchange preprocessing not only eliminates the influence of TMAH, but also possesses the additional merit that the Cl^- anion has remained intact through the cation exchange resin. To further increase the detection limit, on-line preconcentration by ion chromatography has been coupled with the above scheme by cation exchange resin preprocessing, via this technique, the detection limit of sub 1 ppb level is achieved with no need of adding a standard.

Citation Download Citation

Bang-Chein Ho, Mong-Ling Chang, and Yu-Ping Lin "Techniques for the analysis of Cl^- ion in TMAH", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312436

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