Effect of lens aberrations as a function of illumination condition on full-field process windows

Audrey M. Davis; Andrew E. Bair; Bradley D. Lantz; Jeffrey R. Johnson; Charles R. Spinner III

doi:10.1117/12.310818

29 June 1998 Effect of lens aberrations as a function of illumination condition on full-field process windows

Audrey M. Davis, Andrew E. Bair, Bradley D. Lantz, Jeffrey R. Johnson, Charles R. Spinner III

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310818
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The effect of lens aberrations on the process windows of a 248 nm stepper is presented for multiple locations within the exposure field and for various illumination conditions. It is shown that the effect on the process window depends on the field location and the illumination condition. The common process window for multiple field locations is significantly reduced from the single location result. Process window data obtained with one illumination condition is shown to be useful in predicting results with other illumination conditions.

Citation Download Citation

Audrey M. Davis, Andrew E. Bair, Bradley D. Lantz, Jeffrey R. Johnson, and Charles R. Spinner III "Effect of lens aberrations as a function of illumination condition on full-field process windows", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310818

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