Paper
13 September 1982 Comparison Of Autoalign Techniques
Bruce Heflinger
Author Affiliations +
Abstract
Design criteria for wafer stepper alignment systems are discussed. Several examples are presented. A glossary of terms is included.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce Heflinger "Comparison Of Autoalign Techniques", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933562
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CITATIONS
Cited by 5 scholarly publications.
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KEYWORDS
Optical alignment

Semiconducting wafers

Reticles

Tolerancing

Photoresist materials

Distortion

Optical lithography

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