Internal field emission of diamond film cold cathode

Weibiao Wang; Changchun Jin; Hong Ji; Guang Yuan; Zhengshen Chu; Xiwu Fan

doi:10.1117/12.319663

18 August 1998 Internal field emission of diamond film cold cathode

Weibiao Wang, Changchun Jin, Hong Ji, Guang Yuan, Zhengshen Chu, Xiwu Fan

Proceedings Volume 3560, Display Devices and Systems II; (1998) https://doi.org/10.1117/12.319663
Event: Photonics China '98, 1998, Beijing, China

Abstract

We had fabricated the internal field emission cold cathode of diamond thin film and researched its emission property. Diamond film was growth by microwave CVD technology. Insulator layer was porous oxide aluminum. Grid is Au thin film about 10 nm thickness. Results after measurement show that device had better internal field emission property.

Citation Download Citation

Weibiao Wang, Changchun Jin, Hong Ji, Guang Yuan, Zhengshen Chu, and Xiwu Fan "Internal field emission of diamond film cold cathode", Proc. SPIE 3560, Display Devices and Systems II, (18 August 1998); https://doi.org/10.1117/12.319663

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