Paper
15 October 2001 Optimization of two-photon excitation for 3D optical data storage
DeQiang Chen, YongJun Zhou, Wenhao Huang, Andong Xia
Author Affiliations +
Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444746
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
Two-photon absorption is becoming more interesting in the areas of 3D microfabrication and high density optical data storage because of its special application potential. Large volume information requires faster reading and writing speed for its effective application. With intense femtosecond laser, the multifocal multiphoton microscopy (MMM) may provide a good choice with fast reading/writing speed for three-dimensional data storages. However, the Gaussian laser beam profile will result in less light in the corners than the center, which produces a heterogeneous image from a uniform plane. In this paper we try to solve this problem by employing a method based on optical limiting effect. The two-photon optical limiting caused by intense femtosecond laser will change the laser intensity distribution spatially and convert the Gaussian profiles into flat beams. We try to discuss the reshaping effects by considering the two-photon optical limiting effects at different laser powers and two-photon absorption coefficients. Our results indicate that by choosing a TPA medium with appropriate two-photon coefficient and suitable laser input intensity, we can easily gain a much more flat laser beam for the MMM.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
DeQiang Chen, YongJun Zhou, Wenhao Huang, and Andong Xia "Optimization of two-photon excitation for 3D optical data storage", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); https://doi.org/10.1117/12.444746
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