Paper
1 July 2005 A novel suspended gate MOSFET pressure sensor
Jose A. Segovia, Montserrat Fernandez-Bolanos, Jose M. Quero
Author Affiliations +
Proceedings Volume 5836, Smart Sensors, Actuators, and MEMS II; (2005) https://doi.org/10.1117/12.608718
Event: Microtechnologies for the New Millennium 2005, 2005, Sevilla, Spain
Abstract
A novel pressure sensor based on a Suspended Gate MOSFET is presented. The SG-MOSFET structure, fabricated in a SOI wafer, is modified by etching the bulk of the wafer back side in order to create a thin clamped membrane and to be able to measure pressure displacements. The whole structure forms a diaphragm, in which the bottom plate is a pressure sensitive terminal and the top plate forms the MOSFET gate terminal where the air-gap is proportional to the pressure application as gate insulator. The change of this air-gap distance modifies the drain current of the sensing MOSFET. The gate is suspended by arms allowing to modify the sensitivity of this sensor by a drive voltage. Two operation modes are proposed, one uses the drain current variations as output signal and the second one take advantage of the snap down effect. A model along with Finite Element Method simulations were made to provide a design model for the pressure sensor. Some pressure sensors were been fabricated with different dimensions.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jose A. Segovia, Montserrat Fernandez-Bolanos, and Jose M. Quero "A novel suspended gate MOSFET pressure sensor", Proc. SPIE 5836, Smart Sensors, Actuators, and MEMS II, (1 July 2005); https://doi.org/10.1117/12.608718
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Sensors

Field effect transistors

Switches

Microelectromechanical systems

Oxides

Semiconducting wafers

Etching

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