Rapid temperature processing (RTP) system for selenization of photovoltaic materials

Michał Warzecha; Henryk Jankowski; Lidia Maksymowicz; Tadeusz Pisarkiewicz; Cezary Worek

doi:10.1117/12.721040

20 October 2006 Rapid temperature processing (RTP) system for selenization of photovoltaic materials

Michał Warzecha, Henryk Jankowski, Lidia Maksymowicz, Tadeusz Pisarkiewicz, Cezary Worek

Proceedings Volume 6348, Optoelectronic and Electronic Sensors VI; 634808 (2006) https://doi.org/10.1117/12.721040
Event: Optoelectronic and Electronic Sensors VI, 2006, Zakopane, Poland

Abstract

Rapid Temperature Processing (RTP) methodology is widely applied in thin-film photovoltaic materials technology due to high quality of fabricated cells and also perspectives for their mass manufacturing. This paper describes a RTP device structure which contains the graphite reactor for selenization of Cu/In or Cu/In/Se precursors. Strong nonlinearity of radiative energy transfer makes RTP controlling difficult so it still needs to be improved. Using mathematical model of the device, we are proposing the method of process controlling. Experimentally obtained temperature profiles of Rapid Temperature Processes are presented and compared with temperature profile of typical CIS selenization graphite reactor. Presented steering procedure, based on our model, gives improves by decreasing time needed for selenization and simultaneously reducing costs of the process.

Citation Download Citation

Michał Warzecha, Henryk Jankowski, Lidia Maksymowicz, Tadeusz Pisarkiewicz, and Cezary Worek "Rapid temperature processing (RTP) system for selenization of photovoltaic materials", Proc. SPIE 6348, Optoelectronic and Electronic Sensors VI, 634808 (20 October 2006); https://doi.org/10.1117/12.721040

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