Paper
12 May 2008 Femtosecond laser milling of ultrathin films of LiNbO3
Ophir Gaathon, Avishai Ofan, Jerry Dadap, Alexander Wirthmüller, Lakshmanan Vanamurthy, Sasha Bakhru, Hassaram Bakhru, Richard M. Osgood Jr.
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Abstract
We report femtosecond laser cutting of ultrathin ferroelectric sheets. This process enables one to do rapid patterning of microns-thick films of complex oxides such as LiNbO3, which are obtained via ion-beam exfoliation from standard wafers. Cutting these fragile samples is extremely difficult using standard methods but can be done effectively with ultrafast lasers. To achieve fast writing speed, we employ a high-repetition-rate amplified Ti:sapphire laser system with a pulse peak power of ~100MW. Optimization of the depth and quality of cut were determined as a function of laser pulse energy, crystallographic axes, optical polarization, and pre- and post-ablation chemical treatments.
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Ophir Gaathon, Avishai Ofan, Jerry Dadap, Alexander Wirthmüller, Lakshmanan Vanamurthy, Sasha Bakhru, Hassaram Bakhru, and Richard M. Osgood Jr. "Femtosecond laser milling of ultrathin films of LiNbO3", Proc. SPIE 7005, High-Power Laser Ablation VII, 70052Y (12 May 2008); https://doi.org/10.1117/12.785420
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KEYWORDS
Laser ablation

Crystals

Femtosecond phenomena

Laser crystals

Thin films

Etching

Laser systems engineering

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