Macroscopic and stochastic modeling approaches to pattern doubling by acid catalyzed cross-linking

Jürgen Fuhrmann; André Fiebach; George P. Patsis

doi:10.1117/12.846491

30 March 2010 Macroscopic and stochastic modeling approaches to pattern doubling by acid catalyzed cross-linking

Jürgen Fuhrmann, André Fiebach, George P. Patsis

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76392I (2010) https://doi.org/10.1117/12.846491
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Pattern doubling by cross-linking of a spacer triggered by residual acid diffusion from a previously developed primary structure into the spacer is a possible option to create structure widths below the nominal resolution of the optical process. An advantage of such a process step would be the self-alignment to the primary structure, which would render a second exposure step unnecessary. Using macroscopic and stochastic modeling approaches, we demonstrate that it may be possible to control the width of the secondary structure created by cross-linking by the amount of quencher base added.

Citation Download Citation

Jürgen Fuhrmann, André Fiebach, and George P. Patsis "Macroscopic and stochastic modeling approaches to pattern doubling by acid catalyzed cross-linking", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392I (30 March 2010); https://doi.org/10.1117/12.846491

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