Study on controlling the profile of holographic ion beam etching gratings

Quan Liu; Hai-bin Wang; Jian-hong Wu; Peng Sun; Guo-lin Qian; Dan Wang

doi:10.1117/12.866035

22 October 2010 Study on controlling the profile of holographic ion beam etching gratings

Quan Liu, Hai-bin Wang, Jian-hong Wu, Peng Sun, Guo-lin Qian, Dan Wang

Proceedings Volume 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 765719 (2010) https://doi.org/10.1117/12.866035
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

To alleviate the difficulty in controlling the profile of the photoresist grating mask, advanced segment motion algorithm has been applied to simulate and analyze the evolution of the surface contour in ion beam etching. The simulation indicates that the combination of ion beam etching and reactive ion beam etching can effectively control the duty cycle of the holographic ion beam etching gratings. This has also been validated by the fabrication of four kinds of gratings with different periods (6.66μm, 3.33μm, 2μm, 1μm). This finding contributes to the fabrication of the holographic ion beam etching gratings because it helps to simplify the holographic exposure and development.

Citation Download Citation

Quan Liu, Hai-bin Wang, Jian-hong Wu, Peng Sun, Guo-lin Qian, and Dan Wang "Study on controlling the profile of holographic ion beam etching gratings", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765719 (22 October 2010); https://doi.org/10.1117/12.866035

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