Research of optical imaging system for integral stereolithography system

Guangshen Xu; Jian Yang; Jing Jin; Sheng Luo

doi:10.1117/12.871542

21 July 2010 Research of optical imaging system for integral stereolithography system

Guangshen Xu, Jian Yang, Jing Jin, Sheng Luo

Proceedings Volume 7749, 2010 International Conference on Display and Photonics; 774915 (2010) https://doi.org/10.1117/12.871542
Event: 2010 International Conference on Display and Photonics, 2010, Nanjing, China

Abstract

The development of integral SL system with low cost for fabrication small size object has important significance, and dynamic pattern generator is the key component for a integral SL system. To set up the dynamic pattern generator using digital micro-mirror device (DMD), an optical imaging system, which produces Section pattern of a object on working plane and solidifies photo curable resin, has been designed. The optical imaging system consists of two components. The component 1 is made up of 3 positive lenses, and the component 2 consists of a negative lens, two positive lenses and a aperture. To reduce the coma and astigmatism of the image produced with the optical imaging system, the aperture position is optimized with soft ZEMAX. The best location for the stop is 1 mm before the second lens in component 2. As a result, the coma is 3.7 wavelengths, and astigmatism is -0.18 wavelengths. The design of the optical imaging system lays a foundation for set-up low-cost integral SL system.

Citation Download Citation

Guangshen Xu, Jian Yang, Jing Jin, and Sheng Luo "Research of optical imaging system for integral stereolithography system", Proc. SPIE 7749, 2010 International Conference on Display and Photonics, 774915 (21 July 2010); https://doi.org/10.1117/12.871542

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