Counter-facing plasma focus system as an efficient and long-pulse EUV light source

H. Kuwabara; K. Hayashi; Y. Kuroda; H. Nose; K. Hotozuka; M. Nakajima; K. Horioka

doi:10.1117/12.879140

8 April 2011 Counter-facing plasma focus system as an efficient and long-pulse EUV light source

H. Kuwabara, K. Hayashi, Y. Kuroda, H. Nose, K. Hotozuka, M. Nakajima, K. Horioka

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692R (2011) https://doi.org/10.1117/12.879140
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A plasma focus system composed of a pair of counter-facing coaxial plasma guns is proposed as a long-pulse and efficient EUV light source. A proof-of-concept experiment demonstrated that with an assist of breakdown and outer electrode connections, current sheets evolved into a configuration for stable plasma confinement at the center of the electrode. The current sheets could successively compress and confine the high energy density plasma every half period of the discharge current, enabling highly repetitive light emissions in extreme ultraviolet region with time duration in at least ten microseconds for Xe plasma. Also, we confirmed operations of our system for Li plasma. We estimated the highest EUV energy in Li plasma operation at 93mJ/4π sr per 2% bandwidth per pulse.

Citation Download Citation

H. Kuwabara, K. Hayashi, Y. Kuroda, H. Nose, K. Hotozuka, M. Nakajima, and K. Horioka "Counter-facing plasma focus system as an efficient and long-pulse EUV light source", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692R (8 April 2011); https://doi.org/10.1117/12.879140

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