By combining state of the art optimization and machine learning techniques (photonics inverse design) with new fabrication approaches, we can implement large area metastructures and integrated photonics with superior photonics. In addition to making photonics more robust (e.g., to errors in fabrication and variation in temperature), more compact, and more efficient, this approach can also enable new functionalities. While in our early work we focused on inverse design and demonstration of individual photonic devices, our more recent work focused on scaling it to photonic integrated circuits and large area metasurfaces that can be fabricated in a commercial semiconductor foundry.
|