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30 April 2023 Engineering chemical processes for sustainability in patterning nano-electronics
Jane P. Chang, Owen Watkins
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Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC124990F (2023) https://doi.org/10.1117/12.2661701
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
The continued acceleration in dimensional scaling of logic and memory semiconductor devices requires the integration of more emerging multifunctional materials, which demand more complex and aggressive chemical processes, thereby heightening the environmental, health and safety risks. To realize the sustainability in etch and patterning integration, a three pronged approach must be undertaken. First, new alternative gases must be developed to replace hydrofluorocarbon (HFC) gases. Next, mitigating strategies must be developed to minimize any downstream reaction that can cause serious health and safety incidents. Finally, non-HFC/non-halogen etch chemistries must be tested to demonstrate feasibility in patterning nano-scale structures.
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Jane P. Chang and Owen Watkins "Engineering chemical processes for sustainability in patterning nano-electronics", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990F (30 April 2023); https://doi.org/10.1117/12.2661701
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KEYWORDS
Chemical reactions
Optical lithography
Chemical engineering
Nanoelectronics
Safety
Logic
Manufacturing
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