High power optics in the semiconductor industry

Adriaan van Zwol

doi:10.1117/12.2682749

24 November 2023 High power optics in the semiconductor industry

Adriaan van Zwol

Proceedings Volume PC12726, Laser-Induced Damage in Optical Materials 2023; PC127260C (2023) https://doi.org/10.1117/12.2682749
Event: SPIE Laser Damage, 2023, Dublin/Livermore, California, United States

Abstract

ASML is the leading provider of lithography equipment in the semiconductor industry. Lithography is one of the cornerstones on which todays semiconductor technology is built. It’s a journey that started with Moore’s law in the 60’s and has continued until today and will continue in the future. In the latest generation of technology a high power 30kW CO2 laser is used to ignite a tin plasma that emits 13.5nm photons to enable the printing of 7nm and below linewidths. This keynote address will give a small ‘sneak peak’ into what technology enables todays EUV chip manufacturing industry. It will also highlight some of the Laser Optics damage challenges we have with the high power CO2 laser ASML uses. The presentation will also show some of the theoretical understandings on laser damage that were built up along the way and illustrate where there are still some challenges ahead.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Adriaan van Zwol "High power optics in the semiconductor industry", Proc. SPIE PC12726, Laser-Induced Damage in Optical Materials 2023, PC127260C (24 November 2023); https://doi.org/10.1117/12.2682749

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