Presentation
9 March 2024 Exploring carrier diffusion in varying thickness InGaN/GaN quantum wells
Simon Litschgi, Fabian Rol, Amélie Dussaigne, Bruno Gayral, Névine Rochat, Guillaume Veux, Quentin Durlin
Author Affiliations +
Abstract
Recent carrier diffusion length measurements in InGaN quantum wells (QWs) revealed the potential for carriers to travel tens of micrometers before recombination. These observations are consistent with the efficiency loss in InGaN micro-Light-Emitting-Diodes (µLEDs) with size reduction down to a few microns. From micro-photoluminescence and cathodoluminescence measurements, a QW-width-dependent study on InGaN QWs grown on various substrates show a diffusion length reduction with QW thickness. This is consistent with the fact that carrier lifetime decreases with QW-width in c-plane InGaN QWs, due to a Quantum-Confined-Stark-Effect (QCSE) reduction. Additionally, a study on the effects of carrier density and substrate-type will be presented.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Simon Litschgi, Fabian Rol, Amélie Dussaigne, Bruno Gayral, Névine Rochat, Guillaume Veux, and Quentin Durlin "Exploring carrier diffusion in varying thickness InGaN/GaN quantum wells", Proc. SPIE PC12886, Gallium Nitride Materials and Devices XIX, PC128860C (9 March 2024); https://doi.org/10.1117/12.3002269
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KEYWORDS
Quantum wells

Diffusion

Indium gallium nitride

Gallium nitride

Sapphire

Silicon

Quantum optical communication

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