Presentation
13 March 2024 Al2O3 photonic integrated circuits for UV optical microscopy
Author Affiliations +
Abstract
Recent advances in oxide thin film deposition techniques are very promising for extending the operating wavelength of silicon photonics into the UV range. The use of this wavelength range for applications is still limited due to the difficulty to handle UV optical signals. UV photonic integrated circuits will solve this problem and they will open new avenues for biological, healthcare and optical quantum computing applications. This talk will review recent results achieved with atomic layer deposition of alumina on thermal oxide wafers for UV optical microscopy applications. We will discuss the main advantages of UV photonic integrated circuits for the implemention of structured illumination microscopy and quantitative phase imaging.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicolas Le Thomas "Al2O3 photonic integrated circuits for UV optical microscopy", Proc. SPIE PC12889, Integrated Optics: Devices, Materials, and Technologies XXVIII, PC1288903 (13 March 2024); https://doi.org/10.1117/12.3000890
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KEYWORDS
Ultraviolet radiation

Optical microscopy

Photonic integrated circuits

Integrated optics

Oxides

UV optics

Wafer-level optics

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