Chemistry of Lithographic Patterning Materials

doi:10.1117/3.2642420.ch4

Book: Chemistry and Lithography, Second Edition, Vol. 2: Chemistry in Lithography

Author(s): Uzodinma Okoroanyanwu

Published: 2023

https://doi.org/10.1117/3.2642420.ch4

Author Affiliations +

Abstract

Present day lithographic patterning materials and chemicals, including inks, resists, anti-reflection coatings, casting solvents, developers, strippers, etc., evolved largely from technologies developed in the printing industry. Integrated circuits (ICs) and circuit boards were unheard of in 1798 when Senefelder invented lithography and in 1826 when Niepcé invented photolithography. Since those early days, lithographic chemicals have evolved from being extracted from natural sources to being derived almost exclusively from synthetic sources today. They have also grown in importance along with the electronics industry, since even the simplest electronic systems today are patterned with resists, using ever more sophisticated arrays of lithographic chemicals. In this chapter we present an overview of lithographic chemicals used in patterning IC devices and printing newspapers, textbooks, posters and the like, while making historical references to similar materials used in lithography in earlier times.