16 December 2013 Design of ultrasmall plasmonic coaxial lasers on Si
Kim-Peng Lim, Chee-Wei Lee, Gurpreet Singh, Qian Wang
Author Affiliations +
Abstract
An ultrasmall plasmonic coaxial laser made of metal–semiconductor–metal on a silicon substrate through an interlayer bonding was designed. From the effective refractive indices and the transparent material gain, the nanoscale structural dimensions with both the radius and the width at 80 nm for the coaxial plasmonic waveguide were decided. The influence of the interlayer bonding material on the optimization of resonant wavelength and Q-factor was evaluated. A three-dimensional body-of-revolution finite-difference time-domain method was used to show that a coaxial cavity with a SiO2 interlayer can laze at around 1480-nm wavelength with a net optical threshold power density of about 800  W/cm2 and a subwavelength mode volume of 0.014(λ/2n)3. This nanolaser on silicon platform will benefit those working on nanophotonic integrated circuits.
© 2013 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2013/$25.00 © 2013 SPIE
Kim-Peng Lim, Chee-Wei Lee, Gurpreet Singh, and Qian Wang "Design of ultrasmall plasmonic coaxial lasers on Si," Journal of Nanophotonics 7(1), 070598 (16 December 2013). https://doi.org/10.1117/1.JNP.7.070598
Published: 16 December 2013
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Silicon

Semiconductor lasers

Plasmonics

Metals

Waveguides

Refractive index

Optical simulations

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