Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides

S. Dutta; H. E. Jackson; J. T. Boyd

doi:10.1117/12.7973058

1 February 1983 Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides

S. Dutta, H. E. Jackson, J. T. Boyd

Author Affiliations +

Optical Engineering, Vol. 22, Issue 1, 221117 (February 1983). https://doi.org/10.1117/12.7973058

Abstract

We report considerable success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally oxidized silicon substrates. For the materials Si3N4, Nb2O5, and Ta205, values of waveguide loss less than 1 dB/cm were achieved. Values of waveguide loss as low as 0.01 dB/cm have been measured for laser-annealed ZnO waveguides and for Corning 7059 glass waveguides which have been both laser annealed and had surface coatings applied.

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S. Dutta, H. E. Jackson, and J. T. Boyd "Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides," Optical Engineering 22(1), 221117 (1 February 1983). https://doi.org/10.1117/12.7973058

Published: 1 February 1983

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