Dr. Harold W. Stokes
Lithography R&D Process Engineer at Screen Semiconductor Solutions
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Carbon, Etching, Silicon, Coating, Resistance, Photomasks, Reactive ion etching, Thin film coatings, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Ultraviolet radiation, Annealing, Photoresist materials, Line width roughness, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Metrology, Annealing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Wafer testing, Standards development

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Optical lithography, Polymers, Glasses, Ultraviolet radiation, Annealing, Silicon, Scanning electron microscopy, Line width roughness, Directed self assembly, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Optical lithography, Polymers, Annealing, Oxygen, Scanning electron microscopy, Line width roughness, Directed self assembly, Thin film coatings, Semiconducting wafers, Atmospheric modeling

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Annealing, Scanning electron microscopy, Distance measurement, Directed self assembly, Immersion lithography, Semiconducting wafers

Showing 5 of 13 publications
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