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20 March 2018 Optical design of objectives for reducing photolithography
Dmitry N. Frolov, Olga A. Vinogradova, Vladimir N. Frolov, Pavel S. Vakulov
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Proceedings Volume 10587, Optical Microlithography XXXI; 105871E (2018) https://doi.org/10.1117/12.2301026
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States
Abstract
This paper reviews the technical solutions for reduction optical photolithography systems based on the principle of obtaining a scaled-down object image. Dioptric reduction system design trends are discussed and applied technical solutions for building such systems are proposed. Genuine optical systems are offered which comply with the requirements mentioned above.
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Dmitry N. Frolov, Olga A. Vinogradova, Vladimir N. Frolov, and Pavel S. Vakulov "Optical design of objectives for reducing photolithography", Proc. SPIE 10587, Optical Microlithography XXXI, 105871E (20 March 2018); https://doi.org/10.1117/12.2301026
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KEYWORDS
Objectives
Optical lithography
Lithography
Optical design
Microscopes
Aberration correction
Mirrors
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