Paper
16 November 2018 Novel etching fluids for potassium dihydrogen phosphate
Salmaan Baxamusa, John Adams, Paul Ehrmann, Steven Hawks, Ted Laurence, Marlon Menor, Jemi Ong, Kathleen Schaffers
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Abstract
Absorbing defects such as fractures and contaminants are a leading cause of surface damage in nanosecond pulsed lasers. Etching such defects has proven to be a powerful technique for increasing the laser damage threshold of fused silica, but to date no etching process has been reported for potassium dihydrogen phosphate (KH2PO4 or KDP) or its deuterated analog (DKDP). We show that physical dissolution in water is a viable strategy for etching DKDP surfaces but surface-redeposited byproducts can serve as laser damage precursors. We use a water-in-oil microemulsion to etch engineered surface fractures in DKDP. Etching widens surface fractures laterally and decreases their optical activity, as measured by photoluminescence. The removal of 1 μm of the surface of a DKDP crystal increases the laser damage threshold (λ = 355 nm, 7 ns) of the engineered surface fractures by 2-4 J/cm2 (15-30%).
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Salmaan Baxamusa, John Adams, Paul Ehrmann, Steven Hawks, Ted Laurence, Marlon Menor, Jemi Ong, and Kathleen Schaffers "Novel etching fluids for potassium dihydrogen phosphate", Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 108051G (16 November 2018); https://doi.org/10.1117/12.2500297
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KEYWORDS
Etching

Laser induced damage

Laser damage threshold

Potassium

Luminescence

Crystals

Optical activity

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