Achieve high hotspot detection accuracy by pattern scoring

Xiang Fang; Shou-Yuan Ma; Chien-Nan Lin; Hsu-Tang Liu; Chuan-Chun Lee; Chuen-Huei Yang; I-Y. Chang; Erwin Deng; Ming-Feng Shen; Min-Ying Lu; Ling-Chieh Lin; Hung-Yueh Liao; Elven Huang; Jonathan Muirhead

doi:10.1117/12.2323956

12 June 2018 Achieve high hotspot detection accuracy by pattern scoring

Xiang Fang, Shou-Yuan Ma, Chien-Nan Lin, Hsu-Tang Liu, Chuan-Chun Lee, Chuen-Huei Yang, I-Y. Chang, Erwin Deng, Ming-Feng Shen, Min-Ying Lu, Ling-Chieh Lin, Hung-Yueh Liao, Elven Huang, Jonathan Muirhead

Author Affiliations +

Proceedings Volume 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology; 108070L (2018) https://doi.org/10.1117/12.2323956
Event: Photomask Japan 2018, 2018, Yokohama, Japan

Abstract

In this paper we combined the hotspot pattern library and the rule-based scoring system into a modularized hotspot-checking rule deck running on an automatic flow. Several DFM (design for manufacture) properties criteria will be defined to build a “score board” for hotspot candidates. When hotspots in the input design are highlighted, the scoring system can identify whether a hotspot is a high risk hotspot or not, and define the severity of the hotspots by extracted DFM properties. The automatic flow will detect which layers are contained in the design then generate a modular rule deck with several corresponding hotspot check modules. The flow also takes snapshots of the high risk hotspots according to the score board automatically. After all the essential hotspot data is collected, the flow will automatically create an HTML-format report which has histograms of properties and overview graph that shows the distribution of hotspots. The aforementioned HTML report containing scored DFM properties and snapshots can help result-viewers to identify the high risk hotspots on the design quickly; namely, users can examine hotspots by snapshots without loading the whole design into layout viewer tools. By comparing the hotspot checking result with real defects from wafer data, a true hotspot’s values of DFM properties can be obtained. We believe this is helpful for users to improve their hotspot rules in accuracy.

Citation Download Citation

Xiang Fang, Shou-Yuan Ma, Chien-Nan Lin, Hsu-Tang Liu, Chuan-Chun Lee, Chuen-Huei Yang, I-Y. Chang, Erwin Deng, Ming-Feng Shen, Min-Ying Lu, Ling-Chieh Lin, Hung-Yueh Liao, Elven Huang, and Jonathan Muirhead "Achieve high hotspot detection accuracy by pattern scoring", Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070L (12 June 2018); https://doi.org/10.1117/12.2323956

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
5 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Design for manufacturing

Databases

Rule based systems

Semiconducting wafers

System identification

Photomasks

Visualization

Show All Keywords

Keywords/Phrases

Search In:

Publication Years