Presentation + Paper
5 March 2022 Conduction properties and threshold voltage instability in β-Ga2O3 MOSFETs
Author Affiliations +
Proceedings Volume 12002, Oxide-based Materials and Devices XIII; 1200206 (2022) https://doi.org/10.1117/12.2607362
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract

In this paper we analyze the conduction properties, charge trapping and threshold voltage instability of normally-on β-Ga2O3 lateral MOSFETs for high power applications by means of threshold voltage transients. We found that a positive bias applied to the gate induces a rightward shift in the threshold voltage, caused by the trapping of electrons at border traps close to the semiconductor-dielectric interface.

The amount of trapped charge was investigated by an innovative fast-CV experimental setup and was found to follow a logarithmic kinetic in time, modeled by a generalization of the inhibition model that takes into account the effect of columbic repulsion in stress conditions.

Then, we developed a model for the gate conduction based on temperature dependent IG-VG characteristics. We detected that the gate current characterized in temperature and bias conditions similar to the ones used for the stress is dominated by Poole-Frenkel conduction assisted by a deep level at EC - 0.12 eV.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Manuel Fregolent, Enrico Brusaterra, Carlo De Santi, Kornelius Tetzner, Joachim Würfl, Gaudenzio Meneghesso, Enrico Zanoni, and Matteo Meneghini "Conduction properties and threshold voltage instability in β-Ga2O3 MOSFETs", Proc. SPIE 12002, Oxide-based Materials and Devices XIII, 1200206 (5 March 2022); https://doi.org/10.1117/12.2607362
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KEYWORDS
Field effect transistors

Dielectrics

Oxides

Gallium

Semiconductors

Interfaces

Metalorganic chemical vapor deposition

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