Presentation + Paper
2 December 2022 Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings
Author Affiliations +
Abstract
Crystalline sesquioxide films (Sc2O3, Y2O3, Lu2O3) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO2, HfO2, Nb2O5). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO2 in the multi-pulse test regime. The results are the basis for designs of damage resistant re ective components used in ultrashort-pulse lasers.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marek Stehlík, Goby Govindassamy, Janis Zideluns, Fabien Lemarchand, Frank Wagner, Julien Lumeau, Jacob Mackenzie, and Laurent Gallais "Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings", Proc. SPIE 12300, Laser-Induced Damage in Optical Materials 2022, 123000G (2 December 2022); https://doi.org/10.1117/12.2641792
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lutetium

Aluminum

Sapphire

Refractive index

Laser induced damage

Niobium

Laser damage threshold

RELATED CONTENT


Back to Top