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This study describes a parametric model of diffuse reflectance, based on reduction of absorption spectra for NIR-SWIR absorbing dyes on substrates, using critical feature isolation and projection. The critical features are identified through a structural analysis of the peaks, troughs, and points of inflection in the calculated Kubelka-Munk absorption spectra from diffuse reflectance measurements. These features are then parameterized and projected into a reduced feature subspace to effectively capture the fundamental characteristics of the absorbing dyes. The parametric model is structured for combination with effective-medium models of mixtures and deposit-on-substrate micro or meso structure
R. Viger,S. Ramsey,T. Mayo, andS. G. Lambrakos
"Analytical model of diffuse reflectance for NIR-SWIR absorbing-dye
formulations using reduced absorbance functions", Proc. SPIE 12514, Image Sensing Technologies: Materials, Devices, Systems, and Applications X, 125140C (15 June 2023); https://doi.org/10.1117/12.2659075
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R. Viger, S. Ramsey, T. Mayo, S. G. Lambrakos, "Analytical model of diffuse reflectance for NIR-SWIR absorbing-dye
formulations using reduced absorbance functions," Proc. SPIE 12514, Image Sensing Technologies: Materials, Devices, Systems, and Applications X, 125140C (15 June 2023); https://doi.org/10.1117/12.2659075