Poster + Paper
15 June 2023 Analytical model of diffuse reflectance for NIR-SWIR absorbing-dye formulations using reduced absorbance functions
R. Viger, S. Ramsey, T. Mayo, S. G. Lambrakos
Author Affiliations +
Conference Poster
Abstract
This study describes a parametric model of diffuse reflectance, based on reduction of absorption spectra for NIR-SWIR absorbing dyes on substrates, using critical feature isolation and projection. The critical features are identified through a structural analysis of the peaks, troughs, and points of inflection in the calculated Kubelka-Munk absorption spectra from diffuse reflectance measurements. These features are then parameterized and projected into a reduced feature subspace to effectively capture the fundamental characteristics of the absorbing dyes. The parametric model is structured for combination with effective-medium models of mixtures and deposit-on-substrate micro or meso structure
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Viger, S. Ramsey, T. Mayo, and S. G. Lambrakos "Analytical model of diffuse reflectance for NIR-SWIR absorbing-dye formulations using reduced absorbance functions", Proc. SPIE 12514, Image Sensing Technologies: Materials, Devices, Systems, and Applications X, 125140C (15 June 2023); https://doi.org/10.1117/12.2659075
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KEYWORDS
Dyes

Analytic models

Reflectivity

Diffuse reflectance spectroscopy

Absorption spectrum

Refraction

Absorbance

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