Metal infiltration into chemically amplified resists to improve pattern fidelity

Kazuki Yamada; Tomohito Yamaji; Reiko Tsuzuki; Makoto Muramatsu

doi:10.1117/12.3010356

9 April 2024 Metal infiltration into chemically amplified resists to improve pattern fidelity

Kazuki Yamada, Tomohito Yamaji, Reiko Tsuzuki, Makoto Muramatsu

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571R (2024) https://doi.org/10.1117/12.3010356
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

We introduce a metal infiltration technique to improve lithographic pattern fidelity. By applying vaporized metal-containing gas, metal was infiltrated into a chemically amplified resist (CAR) to alter the etching resistivity. Interestingly, the altered CAR exhibited both metal and organic properties, exhibiting etch selectivity to spin-on-glass and spin on carbon, respectively. We explored the properties of metal-infiltrated CAR and used them to improve pattern fidelity. For example, hole pattern could be transferred more rectangularly. In addition, we investigated whether hole shrink could be realized by volume expansion.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Kazuki Yamada, Tomohito Yamaji, Reiko Tsuzuki, and Makoto Muramatsu "Metal infiltration into chemically amplified resists to improve pattern fidelity", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571R (9 April 2024); https://doi.org/10.1117/12.3010356

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