Paper
16 April 1993 Modeling of high-density plasma sources
David B. Graves, Han-Ming Wu, Robert K. Porteous
Author Affiliations +
Proceedings Volume 1803, Advanced Techniques for Integrated Circuit Processing II; (1993) https://doi.org/10.1117/12.142910
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States
Abstract
The two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David B. Graves, Han-Ming Wu, and Robert K. Porteous "Modeling of high-density plasma sources", Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); https://doi.org/10.1117/12.142910
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KEYWORDS
Electrons

Ions

Plasma

Magnetism

Ionization

Microwave radiation

Picosecond phenomena

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