Photoreflectance study of GaAs/GaAlAs digital alloy compositionally graded structures

Hao Qiang; Fred H. Pollak; Ying-Sheng Huang; W. S. Chi; R. Droopad; David L. Mathine; George N. Maracas

doi:10.1117/12.175706

11 May 1994 Photoreflectance study of GaAs/GaAlAs digital alloy compositionally graded structures

Hao Qiang, Fred H. Pollak, Ying-Sheng Huang, W. S. Chi, R. Droopad, David L. Mathine, George N. Maracas

Proceedings Volume 2139, Quantum Well and Superlattice Physics V; (1994) https://doi.org/10.1117/12.175706
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

We have studied the photoreflectance spectra at 300 K and 80 K related to the intersubband transitions from several (001) GaAs/GaAlAs structures fabricated by molecular beam epitaxy using the digital alloy compositional grading (DACG) method. These samples include an asymmetric triangular quantum well (ATQW) and three rectangular quantum wells (RQW) with different unit cells [50 angstrom (X 2), 25 angstrom (X 4) and 12.5 angstrom (X 8)]. For the ATQW comparison of the observed intersubband resonances with a theoretical calculation (envelope function method) provided a self-consistent verification that the DACG produced the intended result, i.e., an effective linearly graded profile. For the RQW materials the 12.5 angstrom unit cell sample essentially had the characteristics of the intended analog configuration while the other two samples displayed observable differences.

Citation Download Citation

Hao Qiang, Fred H. Pollak, Ying-Sheng Huang, W. S. Chi, R. Droopad, David L. Mathine, and George N. Maracas "Photoreflectance study of GaAs/GaAlAs digital alloy compositionally graded structures", Proc. SPIE 2139, Quantum Well and Superlattice Physics V, (11 May 1994); https://doi.org/10.1117/12.175706

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