Parallel photomask pattern data conversion and verification system

Yasunori Kanai; Toshiji Shimada; Kazunari Sekigawa; Makoto Nishi; Yasufumi Ishihara; Jun-ichi Mori; Satoshi Akutagawa; Kazuhiko Takahashi; Touru Miyauchi

doi:10.1117/12.245220

24 July 1996 Parallel photomask pattern data conversion and verification system

Yasunori Kanai, Toshiji Shimada, Kazunari Sekigawa, Makoto Nishi, Yasufumi Ishihara, Jun-ichi Mori, Satoshi Akutagawa, Kazuhiko Takahashi, Touru Miyauchi

Author Affiliations +

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245220
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

This system is designed to convert and to verify different types of LSI layout design data and EB writer data, such as GDS-II, MEBES, and JEOL, with the help of its original internal format. The internal format data can be processed not only by a single workstation sequentially but also by network-linked workstations or a single workstation having two or more processing units concurrently. This parallel processing mechanism enables the system to reduce total processing time when handling large volume of data. The resultant internal format data produced by the conversion processes including logical operations, magnifications, and re-sizing operations can be immediately verified by built-in DRC program that is driven by a series of user commands, which consequently yields highly reliable output EB writer data. The built-in pattern viewer can graphically visualize any combination of the layout design data, the EB writer data, and the results of each conversion and verification in the same display window to provide users with an intuitive and easy method for verification. The features of the system and the parallel processing performance are described in this paper.

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Yasunori Kanai, Toshiji Shimada, Kazunari Sekigawa, Makoto Nishi, Yasufumi Ishihara, Jun-ichi Mori, Satoshi Akutagawa, Kazuhiko Takahashi, and Touru Miyauchi "Parallel photomask pattern data conversion and verification system", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245220

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KEYWORDS

Data conversion

Photomasks

Manufacturing

Computing systems

Data processing

Parallel processing

Visualization

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