Electron field emission from diamond-carbon thin films and amorphous carbon-polyimide composite films

Yunjun Li; Jintian He; Ning Yao; Jianen Wang; Zhaoqi Bi; Binglin Zhang; Zhiben Gong

doi:10.1117/12.253345

30 September 1996 Electron field emission from diamond-carbon thin films and amorphous carbon-polyimide composite films

Yunjun Li, Jintian He, Ning Yao, Jianen Wang, Zhaoqi Bi, Binglin Zhang, Zhiben Gong

Proceedings Volume 2892, Display Devices and Systems; (1996) https://doi.org/10.1117/12.253345
Event: Photonics China '96, 1996, Beijing, China

Abstract

Electron emission was obtained from discontinuous diamond thin films containing numerous carbon inclusions (diamond- carbon films) which were deposited on Mo using microwave chemical vapor deposition techniques. The films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. The square resistance of the films varied from 3 K(Omega) to 20 M(Omega) , and the maximum emission current of 1.4 mA was obtained from a broad emitting area of 15 X 5 mm². The Fowler-Nordheim (FN) behavior of some samples was piecewise linear, which was similar to the typical FN curves of p-type silicon. A simple field emission device was demonstrated using the diamond-carbon cold cathode. The lower turn-on electrical field and higher current density was obtained from amorphous carbon-polyimide films deposited on silicon substrate by pulse laser deposition for the first time. The locations of electron emission sites were observed using transparent conducting anode technique.

Citation Download Citation

Yunjun Li, Jintian He, Ning Yao, Jianen Wang, Zhaoqi Bi, Binglin Zhang, and Zhiben Gong "Electron field emission from diamond-carbon thin films and amorphous carbon-polyimide composite films", Proc. SPIE 2892, Display Devices and Systems, (30 September 1996); https://doi.org/10.1117/12.253345

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