Future reticle demand and next-generation lithography technologies

Uwe F. W. Behringer; Christian Ehrlich; Olaf Fortange

doi:10.1117/12.346206

23 April 1999 Future reticle demand and next-generation lithography technologies

Uwe F. W. Behringer, Christian Ehrlich, Olaf Fortange

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346206
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

Mask technology has often been considered an enabling for semiconductor fabrication. But today photomasks have evolved to a bottle neck in the every increasing integration process of semiconductor circuits. Regarding to the 1997 SIA roadmap there are very stringent requirements for mask making. Even with the momentary weak Asian market the worldwide demand for reticles will continue to grow. The anticipation of larger reticles has been discussed over years. What ever the reason for the need of larger reticles, the move to the 230 mm X 230 mm reticle size will provide size will provide unique challenges to both the mask equipment manufacturers and mask fabricator. Next Generation Lithography together with their mask techniques are in development and try to come into the market.

Citation Download Citation

Uwe F. W. Behringer, Christian Ehrlich, and Olaf Fortange "Future reticle demand and next-generation lithography technologies", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346206

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