Optical damage testing of materials for use in 157-nm photolithographic systems

Richard G. Morton; Todd J. Embree; Zsolt Bor; Chris K. Van Peski

doi:10.1117/12.435648

14 September 2001 Optical damage testing of materials for use in 157-nm photolithographic systems

Richard G. Morton, Todd J. Embree, Zsolt Bor, Chris K. Van Peski

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435648
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

As photolithographic processes utilize ever shorter wavelengths to produce more densely packed circuitry on silicon chips, the choice of materials suitable for use in the DUV spectral region becomes severely limited. We report here on preliminary life test results for calcium fluoride irradiated at 157 nm by F₂ laser beams. The sample housing and beam delivery tubes were purged continuously with high purity nitrogen to keep the background oxygen level as low as possible and to sweep away any potential organic gases liberated from the sample mounting hardware and overall experimental apparatus. Data were collected to evaluate induced changes in transmission, wavefront distortion and birefringence over the course of billions of shots at a nominal fluence of 0.1 mJ/cm².

Citation Download Citation

Richard G. Morton, Todd J. Embree, Zsolt Bor, and Chris K. Van Peski "Optical damage testing of materials for use in 157-nm photolithographic systems", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435648

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