Paper
19 February 2003 Decomposition of methylene blue with photocatalytic TiO2 thin films deposited by pulsed laser deposition
Masayuki Okoshi, Yusuke Kosuge, Narumi Inoue, Tsugito Yamashita
Author Affiliations +
Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486577
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
Photocatalytic titanium dioxide (TiO2) thin films with large specific surface area were deposited on Si wafers by pulsed laser deposition with sintered TiO2 targets in oxygen gas atmosphere. Angular distributions of the number of droplets and the film thickness were examined. The surface roughness and the film thickness depended on the oxygen gas pressure. Photocatalytic effect of the films deposited at various substrate temperatures was evaluated by photobleaching of methylene-blue-aqueous solution. The TiO2 film deposited at the substrate temperature of 250°C was anatase-type crystal and this film indicated the highest photocatalytic effect.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masayuki Okoshi, Yusuke Kosuge, Narumi Inoue, and Tsugito Yamashita "Decomposition of methylene blue with photocatalytic TiO2 thin films deposited by pulsed laser deposition", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486577
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Oxygen

Titanium dioxide

Thin films

Crystals

Pulsed laser deposition

Silicon

Thin film deposition

Back to Top