Characterization of gratings by Mueller polarimetry in conical diffraction

Antonello De Martino; Tatiana Novikova; Sami BenHatit; Bernard Drevillon; Denis Cattelan

doi:10.1117/12.600537

10 May 2005 Characterization of gratings by Mueller polarimetry in conical diffraction

Antonello De Martino, Tatiana Novikova, Sami BenHatit, Bernard Drevillon, Denis Cattelan

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.600537
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Spectroscopic Ellipsometry is widely used to characterize 1D gratings in the usual planar diffraction geometry, with grating grooves perpendicular to the incidence plane. The Jones matrix of the grating is then diagonal, and it can be measured properly by any conventional ellipsometer. On the other hand, if the grating is measured at different azimuthal angles, i.e. in conical diffraction geometries, its Jones matrix is no longer diagonal. As a result, additional information is available about the grating groove shape, but a generalized ellipsometer, or a Mueller polarimeter, are necessary to retrieve this information completely. We used this approach with photoresist gratings deposited on Si for nominal CDs down to 70 nm. The instrument was an original Mueller polarimeter based on ferroelectric liquid crystals, and operated in the visible. The measured spectra were fitted with a RCWA code suitable for conical diffraction, with rectangular and trapezoidal profiles. This approach proved to greatly reduce the parameter correlations observed with standard SE for very small CDs. The relevance of the trapezoidal profile can be established, and top and bottom CDs can be "disentangled" much more easily than with standard planar diffraction geometry.

Citation Download Citation

Antonello De Martino, Tatiana Novikova, Sami BenHatit, Bernard Drevillon, and Denis Cattelan "Characterization of gratings by Mueller polarimetry in conical diffraction", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.600537

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