Paper
23 March 2005 Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility
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Proceedings Volume 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2005) https://doi.org/10.1117/12.611333
Event: XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2004, Prague, Czech Republic
Abstract
Experiments on direct photo-etching of organic polymers induced by high-intensity nanosecond pulses of soft X-ray radiation from a laser plasma X-ray source based on a gas puff target are presented. X-rays in the wavelength range from about 1 nm to 8 nm were produced by irradiation of the xenon/helium double-stream gas puff target with laser pulses from the Prague Asterix Laser System (PALS). The resulting X-ray pulses were used to irradiate samples from organic polymers and form microstructures. The results show relatively high efficiency of X-ray direct photo-etching that could be useful for micromachining of organic polymers.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henryk Fiedorowicz, Andrzej Bartnik, Michal Bittner, Libor Juha, Josef Krasa, Pavel Kubat, Janusz Mikolajczyk, and Rafal Rakowski "Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility", Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); https://doi.org/10.1117/12.611333
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KEYWORDS
X-rays

Plasma

Polymers

X-ray sources

Polymethylmethacrylate

Micromachining

Aluminum

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