Simulation study on the influence of interface asymmetry on soft x-ray reflectivity of Mo/Si multilayers

Junling Qin; Kui Yi; Jianda Shao; Zhengxiu Fan

doi:10.1117/12.674249

9 June 2006 Simulation study on the influence of interface asymmetry on soft x-ray reflectivity of Mo/Si multilayers

Junling Qin, Kui Yi, Jianda Shao, Zhengxiu Fan

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61491N (2006) https://doi.org/10.1117/12.674249
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

Mo/Si multilayers have been gaining industry interest as a promising choice for the next generation soft-x-ray projection lithography. Usually, an asymmetrical interlayer transition zones is formed in sputtered Mo/Si multilayers and Mo-on-Si interface is thicker than Si-on-Mo one. In order to study the influence of interface asymmetry on soft X-ray reflectivity of Mo/Si multilayers, a four-layer model is used to simulate soft X-ray reflectivity of Mo/Si multilayers at a given wavelength. The simulation study shows that interface asymmetry is not always disadvantageous to reflectivity of Mo/Si multilayers. When the sum of thickness of Mo-on-Si interface and Si-on-Mo interface is fixed, soft X-ray reflectivity of multilayers can be improved through increasing the thickness ratio of Mo-on-Si interface to Si-on-Mo interface. As the thickness of Si-on-Mo interface is fixed, only by increasing the thickness of of Mo-on-Si interface, soft X-ray reflectivity of multilayers can be improved. While the thickness of Mo-on-Si interface is fixed, only by increasing the thickness of Si-on-Mo interface, soft X-ray reflectivity of multilayers can be basically invariable.

Citation Download Citation

Junling Qin, Kui Yi, Jianda Shao, and Zhengxiu Fan "Simulation study on the influence of interface asymmetry on soft x-ray reflectivity of Mo/Si multilayers", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491N (9 June 2006); https://doi.org/10.1117/12.674249

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KEYWORDS

Reflectivity

Interfaces

X-rays

Molybdenum

Silicon

Diffraction

Extreme ultraviolet lithography

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