LIS design for optimum efficiency

Lev Ryzhikov; Yuli Vladimirsky

doi:10.1117/12.659107

15 March 2006 LIS design for optimum efficiency

Lev Ryzhikov, Yuli Vladimirsky

Proceedings Volume 6154, Optical Microlithography XIX; 61542I (2006) https://doi.org/10.1117/12.659107
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

This paper presents an approach to Laser Illumination System (LIS) efficiency optimization for High Numerical Aperture (NA) Microlithography exposure tools. These advanced tool are immersion systems with NA>1 utilizing many Reticle Enhancement Techniques (RET). In order to provide maximum efficiency, especially for high NA systems, the following conditions have been taken into consideration: étendue law for LIS subsystems consisting of sequential optics; proper relations between transverse and longitudinal dimensions of optical path; laser light coherence management by overlap of individual exposure fields generated from different parts of the laser beam; polarization management; flexible illumination partial coherence (PC) management; illumination relay and condenser systems have to be optically matched in order to minimize: pupil ellipticity, field vigneting, and non-telecentricity. Individual importance of listed conditions and their parameters will be explained and discussed as applied to illumination systems with high NA.

Citation Download Citation

Lev Ryzhikov and Yuli Vladimirsky "LIS design for optimum efficiency", Proc. SPIE 6154, Optical Microlithography XIX, 61542I (15 March 2006); https://doi.org/10.1117/12.659107

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