Measurement of thin film interfacial properties using nanosecond laser source

Ajit K. Mal; Sauvik Banerjee; Vijay Gupta

doi:10.1117/12.660429

28 March 2006 Measurement of thin film interfacial properties using nanosecond laser source

Ajit K. Mal, Sauvik Banerjee, Vijay Gupta

Proceedings Volume 6177, Health Monitoring and Smart Nondestructive Evaluation of Structural and Biological Systems V; 61770Y (2006) https://doi.org/10.1117/12.660429
Event: Nondestructive Evaluation for Health Monitoring and Diagnostics, 2006, San Diego, CA, United States

Abstract

A high energy Nd:YAG laser source is used to determine the intrinsic adhesion strength of thin films deposited on substrates. The specimen is designed to convert the thermal energy of the short duration laser pulse to a strong compressive stress on the back face of the substrate. The compressive stress propagates through the layered structure, and upon reflection from the free surface of the film, generates a tensile wave which produces tensile failure of the interface. The stress associated with the interface failure is calculated from a theoretical model of wave propagation through the layered medium. The compressive stress produced by the laser source is determined from a second experiment involving the homogeneous substrate by removing the film. Examples of the applications of the technique in cell biology are presented.

Citation Download Citation

Ajit K. Mal, Sauvik Banerjee, and Vijay Gupta "Measurement of thin film interfacial properties using nanosecond laser source", Proc. SPIE 6177, Health Monitoring and Smart Nondestructive Evaluation of Structural and Biological Systems V, 61770Y (28 March 2006); https://doi.org/10.1117/12.660429

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