Advanced mask data processing for 32nm and beyond

John Nogatch; Dan Hung; Raghava Kondepudy; Johnny Yeap

doi:10.1117/12.793108

19 May 2008 Advanced mask data processing for 32nm and beyond

John Nogatch, Dan Hung, Raghava Kondepudy, Johnny Yeap

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 702833 (2008) https://doi.org/10.1117/12.793108
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

Smaller feature sizes and aggressive Reticle Enhancement Techniques have led to greatly increased mask data file sizes, longer processing times, and shrinking error budgets. Improvements to Mask Data Preparation software can mitigate these trends. Processing time can be reduced by using algorithms which are compatible with scalable multi-core Distributed Processing. Increased pattern uniformity in the fractured output can reduce Critical Dimension variation on the finished mask plate. Procedures for estimating pattern uniformity and CD variation are described.

Citation Download Citation

John Nogatch, Dan Hung, Raghava Kondepudy, and Johnny Yeap "Advanced mask data processing for 32nm and beyond", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702833 (19 May 2008); https://doi.org/10.1117/12.793108

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