Paper
9 September 2008 Strategies for low cost imprint molds
Author Affiliations +
Abstract
The Cost of ownership (COO) due to the mold can be minimized by first creating the smallest possible original. The cost of this original can be reduced by using the lowest possible resolution pattern generator. If the pattern is regular, then analog pattern generation such as interferometry can be used. The small original is then copied to cover the area by either Step and Repeat or Tiling. Finally multiple working copies are made in a tooling tree for production imprint. The cost and life of the working copies depends on the imprint technology.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. P. C. Watts "Strategies for low cost imprint molds", Proc. SPIE 7039, Nanoengineering: Fabrication, Properties, Optics, and Devices V, 70390A (9 September 2008); https://doi.org/10.1117/12.798222
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KEYWORDS
Etching

Lithography

Photomasks

Semiconducting wafers

Interferometry

Manufacturing

Analog electronics

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