Paper
8 November 2012 Study of the durability of the Ru-capped MoSi multilayer surface under megasonic cleaning
Hüseyin Kurtuldu, Abbas Rastegar, Matthew House
Author Affiliations +
Abstract
Because EUV masks lack of a pellicle, they are prone to particle contamination and must be cleaned frequently. Despite the relatively good resistance of the TaN absorber lines to pattern damage by megasonic cleaning, the Ru cap can be easily damaged by it. We demonstrate that the type and concentration of the dissolved gas are critical factors in determining the cavitation that eventually introduces pits on the surface of Ru-capped multilayer films. In particular, oxygen creates many more pits than CO2 under similar conditions. In this paper, we present the results of SEMATECH’s extensive experimental studies of pit creation on Ru-capped multilayer EUV blanks by megasonics as a function of acoustic field power, gas type and concentration in ultra-pure water, and chemicals during sonication.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hüseyin Kurtuldu, Abbas Rastegar, and Matthew House "Study of the durability of the Ru-capped MoSi multilayer surface under megasonic cleaning", Proc. SPIE 8522, Photomask Technology 2012, 85221Q (8 November 2012); https://doi.org/10.1117/12.976857
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Acoustics

Oxygen

Carbon dioxide

Transducers

Extreme ultraviolet

Cavitation

Multilayers

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