Soft nanoimprint lithography of metal oxides for applications in photonic

Marco Abbarchi

doi:10.1117/12.2620046

30 May 2022 Soft nanoimprint lithography of metal oxides for applications in photonic

Marco Abbarchi

Proceedings Volume PC12142, Fiber Lasers and Glass Photonics: Materials through Applications III; PC1214213 (2022) https://doi.org/10.1117/12.2620046
Event: SPIE Photonics Europe, 2022, Strasbourg, France

Abstract

Nanoimprint lithography (NIL) is a method to (nano-) structure inorganic materials from sol-gel liquid formulations and colloidal suspensions onto a surface. This technique, first inspired by embossing techniques, was developed for soft polymer processing, as final or intermediate materials, but is today fully adapted to hard inorganic materials with a high dielectric constant, such as metal oxides, with countless chemical compositions provided by the sol−gel chemistry. Consequently, NIL has become a versatile, high-throughput, and highly precise fabrication method that is mature for lab developments and scaling up. I will first describe generalities of sol-gel dip coating and NIL method for metal oxides (e.g. SiO2, TiO2) and review some of the recent results we obtained in this field, including fabrication of ordered and disordered optical metasurfaces, structural color, anti-reflection coatings, refractive index sensing and enhanced light extraction.

Conference Presentation

Citation Download Citation

Marco Abbarchi "Soft nanoimprint lithography of metal oxides for applications in photonic", Proc. SPIE PC12142, Fiber Lasers and Glass Photonics: Materials through Applications III, PC1214213 (30 May 2022); https://doi.org/10.1117/12.2620046

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