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17 March 2023 Control on wavelength of surface plasmon polaritons on Si excited with an intense femtosecond laser pulse through SiO2 film
Yuto Iida, Raito Muto, Godai Miyaji
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Proceedings Volume PC12408, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVIII; PC124080M (2023) https://doi.org/10.1117/12.2647673
Event: SPIE LASE, 2023, San Francisco, California, United States
Abstract
We have demonstrated surface plasmon polaritons excited on Si transiently metalized with an intense femtosecond laser pulse by measuring the reflectivity of a Si grating changed in the incident angle of the fs pulse. We observed that the incident angle where the sharp dip of the reflectivity appeared was changed by the thickness of SiO2 films. The result demonstrates that the plasmon wavelength is controlled through SiO2 film deposited on Si.
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Yuto Iida, Raito Muto, and Godai Miyaji "Control on wavelength of surface plasmon polaritons on Si excited with an intense femtosecond laser pulse through SiO2 film", Proc. SPIE PC12408, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVIII, PC124080M (17 March 2023); https://doi.org/10.1117/12.2647673
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KEYWORDS
Silicon
Silica
Femtosecond phenomena
Surface plasmon polaritons
Reflectivity
Plasmons
Electrons
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