We have demonstrated surface plasmon polaritons excited on Si transiently metalized with an intense femtosecond laser pulse by measuring the reflectivity of a Si grating changed in the incident angle of the fs pulse. We observed that the incident angle where the sharp dip of the reflectivity appeared was changed by the thickness of SiO2 films. The result demonstrates that the plasmon wavelength is controlled through SiO2 film deposited on Si.
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